离子轰击对Be上Al膜的影响

Study of Effect of Ions Bombardment on Al Coating-Beryllium Substrate

关键词:  离子轰击  铍  界面过渡层  铝膜  微结构

Key words:  ions bombardment  beryllium  interface layer  Al coating  microstructure

摘要:

以Be为基体,采用磁控溅射离子镀在其上镀制Al膜,研究了离子轰击对膜基界面和Al膜微结构的影响。研究表明,在薄膜沉积初期,施加高能量离子轰击和采取循环轰击镀能增加界面形成的Be、Al共混区宽度。不同能量的离子轰击对Al膜微结构有较大影响,不施加离子轰击,Al膜在(111)面择优生长;随着轰击能量升高Al膜在(111)面择优生长趋势减弱,Al膜在(200)面生长趋势加强;当轰击能量超过一定值后,Al膜在(111)面择优生长的趋势又得到加强。晶粒在低能量离子轰击时随轰击能量增加而细化,当较高能量离子轰击引起基体温度升高时,此时晶粒又变大了。

Abstract:

Magnetron sputtering ion plating has been used to make aluminium coating on beryllium substrate.Effect of ions bombardment on morphology,crystallographic orientation and interface layer were studed.The results show that during initial stages of plating,energetic ions bombardment and circle bombardment plating can increase the width of interface layer consisting of Be and Al atom. Al coating grows largely in (111) crystallographic orientation and the grain size is much larger when ions bombardment is none; Al coating begins to grow in crystallographic randomness and the grain size decreases with ions energy increasing,if ions energy is up to a certain value Al coating grows again largely in (111) crystallographic orientation and grain size increases again with ions energy increasing.